What film layers can be prepared by high-energy pulse PVD technology?

Hard wear-resistant film layer

Such as titanium nitride(TiN)film layer.TiN has high hardness,good wear resistance,and chemical stability.TiN film layer prepared by high-energy pulse PVD technology is widely used in the field of tool coating,which can significantly improve the service life of tools.For example,after preparing a TiN film layer on the surface of a metal cutting tool,the wear resistance of the tool during cutting is enhanced,the friction coefficient between the tool and the workpiece is reduced,the cutting force is lowered,and the tool can maintain good cutting performance even during high-speed cutting.

The chromium carbide(CrC)film layer is also a hard wear-resistant film layer that can be prepared by this technology.The CrC film layer has high hardness and anti-wear properties,and performs well in surface protection of mechanical components.For example,some shaft parts that work under harsh working conditions can effectively resist the erosion and wear of external particles on the surface of the CrC film layer.

Decorative film layer

Including a golden zirconium nitride(ZrN)film layer.The ZrN film layer has a gold like appearance color and good corrosion resistance.Preparing ZrN film layer on the surface of decorative items such as jewelry and watch straps can achieve a dual effect of aesthetics and protection.For example,coating the surface of stainless steel jewelry with ZrN film not only gives the jewelry a gorgeous golden appearance,but also prevents it from being corroded by sweat and other substances during daily wear.

Colored oxide film layers can also be prepared using high-energy pulse PVD technology.For example,by controlling process parameters,aluminum oxide(Al₂O3)film layers with different colors can be prepared,which can be used in fields such as building decoration materials and electronic product casings,adding beauty to products.

Functional membrane layer

Superconducting films such as niobium(Nb)based superconducting films can be prepared.In the research and application of superconducting materials,high-energy pulse PVD technology can control the composition and microstructure of the film layer,which is beneficial for improving superconducting performance.For some electronic devices that require superconducting properties,such as superconducting quantum interference devices(SQUID),it is crucial to prepare high-quality superconducting films.

It can also prepare optical thin films,such as anti reflective films.Preparing anti reflective film on the surface of optical lenses can reduce the reflected light on the lens surface and improve the transmittance of the lens.The use of high-energy pulse PVD technology can deposit a uniform and stable anti reflection film layer on the surface of the lens,thereby improving the optical performance of optical components.