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HiPIMS-400A

    A Magnetron sputtering technology that uses high pulse peak power and low pulse duty cycle to generate high sputtering metal ionization rate

HiPIMS is the abbreviation of high power pulse Magnetron sputtering sputtering, which is a Magnetron sputtering technology that uses high pulse peak power and low pulse duty ratio to generate high sputtering metal ionization rate.

HiPIMS-400A is a vacuum deposition power supply created by New Platinum Technology, which is suitable for the needs of coating experiments in colleges and universities. It can output DC+pulse combination, has high pulse peak current, high ionization rate, high discharge density, high particle energy, and good reactivity. It can be used as an upgrade alternative to the DC Magnetron sputtering power supply, and can be used in the existing magnetron system without modification. High power pulse Magnetron sputtering is the first choice in the hard coating process of corrosion resistance and wear resistance.


HiPIMS

Product features:

Multiple waveform settings, with reverse arc suppression ability, and a more delicate film layer.

Especially suitable for multi waveform settings of innovative PVD processes in universities.

It can be remotely monitored and controlled by mobile phones, adjust various parameters, remotely turn off the power, and monitor the operation of the power supply.

The screen is fully synchronized, and the command feedback is fast and accurate. Walking and eating are both controllable and convenient, and even going to the restroom during the experiment will be more leisurely.


HiPIMS

Model

HiPIMS-400A

Peak current

0~200V

Output voltage

200~1000V

Peak current

10~500uS

Frequency range

100~2500Hz

Peak power

400kW

Average power

Pulse 20kW+

Direct-current

Have

Cooling Method

Forced Air Cooling

Input Power Supply

AC380V30kW

Three-phase Four-wire


External Control Communication

RS485

Size

 500*370*600mm

Weight

50kg