Xinbo Technology (Dongguan) CO., LTD
The principle of HiPIMS technology
In 1999, Kouznetsov et al. of Sweden successfully developed the High Power Impulse Magnetron Sputtering (HiPIMS) technology. It is characterized by using high-power pulses as the power supply mode of magnetron sputtering. On the premise of maintaining the same average power, by shortening the pulse time of the pulse power supply (30-300 us) and adjusting the pulse frequency (100-1000 Hz), the instantaneous peak power increases by three orders of magnitude (as shown in the figure below). As a result, ultra-high plasma density (1018~1019 m-3) is obtained, which is 3 to 4 orders of magnitude higher than that of traditional DCMS and MFMS techniques.